Importance of High-Tech Facility
The driving of semiconductor will reach the level of 5 nm and 18” manufacturing processes soon. The driving is an inevitable trend to bring forth improved knowledge, technology, economy, and quality of life in Taiwan. To advance semiconductor technology, designing/ building/certifying/transferring the facility to users is part of and prerequisite to semiconductor Research, Development and Manufacturing (R&D&M.) Therefore, it is important to enhance the scientific and technologic level of semiconductor facility research for further advancing semiconductor R&D&M of Taiwan.
High performance tools, extremely delicate R&D instruments, and ultra pure utilities are needed for advanced semiconductor R&D&M. However, these tools/instruments/utilities must be housed in stringently controlled cleanrooms, operated on stable platforms, and/or performed under an electromagnetic interference.
In addition, to sustain the global competitiveness of Taiwan semiconductor industry and to cope with the new challenges in the coming era of 18” (450mm) wafer production and 5-nanometer manufacturing process, there is an imminent need to enhance the efficiency of design and construction of fabrication plants (fab) and to ensure high quality of the production environment in Taiwan.
Moreover, because of the extremely controlled environment needed for wafer production, semiconductor fab consumes a lot of energy and generates carbon dioxide that affects global warming and ecosystems. To optimize the energy consumption and to minimize the carbon dioxide through real-time intelligent monitoring become inevitable challenging in the coming years.
However, development of the related technologies in the areas of stable platform, electromagnetic free space, ultrapure air cleanroom, energy saving and reduction of carbon dioxide is a complex processes involving many considerations, not typically dealt by an individual discipline. This demands an interdisciplinary approach to collectively resolve the issues with industrial experts. Hopefully, through this collaborative research not only put Taiwan on the upfront research in semiconductor facility R&D.
High performance tools, extremely delicate R&D instruments, and ultra pure utilities are needed for advanced semiconductor R&D&M. However, these tools/instruments/utilities must be housed in stringently controlled cleanrooms, operated on stable platforms, and/or performed under an electromagnetic interference.
In addition, to sustain the global competitiveness of Taiwan semiconductor industry and to cope with the new challenges in the coming era of 18” (450mm) wafer production and 5-nanometer manufacturing process, there is an imminent need to enhance the efficiency of design and construction of fabrication plants (fab) and to ensure high quality of the production environment in Taiwan.
Moreover, because of the extremely controlled environment needed for wafer production, semiconductor fab consumes a lot of energy and generates carbon dioxide that affects global warming and ecosystems. To optimize the energy consumption and to minimize the carbon dioxide through real-time intelligent monitoring become inevitable challenging in the coming years.
However, development of the related technologies in the areas of stable platform, electromagnetic free space, ultrapure air cleanroom, energy saving and reduction of carbon dioxide is a complex processes involving many considerations, not typically dealt by an individual discipline. This demands an interdisciplinary approach to collectively resolve the issues with industrial experts. Hopefully, through this collaborative research not only put Taiwan on the upfront research in semiconductor facility R&D.
由於半導體產業在台灣的大幅發展,不但提升了台灣在國際間的競爭力,促使台灣其他產業技術升級,且帶領台灣地區經濟成長。如此,不僅是對台灣經濟發展有深遠的影響,同時也使得台灣擁有卓越的國際科技地位。根據ITRS (International Technology Roadmap for Semiconductor) 2012 之報導,國際半導體及相關產業將於2018 進入5 奈米 (DRAM 1/2 Pitch),5 奈米 (Gate Length),及18 吋晶圓 (Wafer) 之製程技術至2018 將進入閘寬(Gate Length)5 奈米及18 吋晶圓之製程技術,廠房從施工興建至開始裝設生產設備,將於九個月內完成。
但要推進提昇台灣半導體製程技術的到5奈米及18 吋層次,廠房和實驗室等設施之設計、建造、驗證、完成及轉移使用,是半導體研發製造提昇中一個不可或缺的先決條件。而廠房設施之研發亦是半導體產業研發製造不可或缺的重要環節。提升台灣半導體之製程技術,廠房設施之研發亦應積極配合,不可等閒視之,必須未雨綢繆加速研發。半導體之研發製造過程中,對於環境控制的要求甚為嚴格,隨著製程閘寬(Gate Length) 愈來愈小,晶圓愈來愈大,廠房設施之興建是愈來愈快,投資金額愈來愈高,廠房設施之要求亦愈來愈高。由於半導體對台灣經濟愈來愈重要(台灣12 吋晶圓年產超過一千二百萬片),而半導體研發製造必須在嚴格控制的潔淨室中,因此提昇半導體廠房設施之等級為目前相當重要之課題。.
但要推進提昇台灣半導體製程技術的到5奈米及18 吋層次,廠房和實驗室等設施之設計、建造、驗證、完成及轉移使用,是半導體研發製造提昇中一個不可或缺的先決條件。而廠房設施之研發亦是半導體產業研發製造不可或缺的重要環節。提升台灣半導體之製程技術,廠房設施之研發亦應積極配合,不可等閒視之,必須未雨綢繆加速研發。半導體之研發製造過程中,對於環境控制的要求甚為嚴格,隨著製程閘寬(Gate Length) 愈來愈小,晶圓愈來愈大,廠房設施之興建是愈來愈快,投資金額愈來愈高,廠房設施之要求亦愈來愈高。由於半導體對台灣經濟愈來愈重要(台灣12 吋晶圓年產超過一千二百萬片),而半導體研發製造必須在嚴格控制的潔淨室中,因此提昇半導體廠房設施之等級為目前相當重要之課題。.